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- ISO 17331:2004/Amd 1:2010 EN a3712f79 Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy — Amendment 1

【国际标准】 Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy — Amendment 1
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标准号:
ISO 17331:2004/Amd 1:2010 EN
标准名称:
Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy — Amendment 1
英文名称:
Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy — Amendment 1标准状态:
现行-
发布日期:
2010-07-05 -
实施日期:
出版语种:
EN
- 其它标准
- 上一篇: ISO 17331:2004 EN 77b0a709 Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
- 下一篇: ISO 17332:2001 EN 237905c7 Cinematography — Manufacturer-printed latent image identification information for 35 mm motion-picture colour-print film — Specifications
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